• DocumentCode
    3236929
  • Title

    Recent trends in yield management system

  • Author

    Tsujide, Tohru

  • Author_Institution
    A&E Technol. Center, NEC Corp., Kawasaki, Japan
  • fYear
    1997
  • fDate
    35589
  • Firstpage
    1
  • Lastpage
    7
  • Abstract
    Failure analysis plays a very important role in the early introduction and fast yield improvement of new generation LSIs. Novel failure analysis technologies have been developed including an expert-system-based memory cell failure cause identification system, MEMOFANEX. These predicted causes are statistically related to the particle or pattern defects monitored at each wafer processing step using the software, MEMOLINK, which can lead to a very effective suggestion of which processing step accounts for the low yield problem. In addition, a novel technology named MEMOFAN has successfully isolated many peripheral circuitry failure locations. For logic LSIs a technology is developed to trace LSI´s fault path back to the location of the defect using an electron beam voltage image. With this technique, about 800 logic LSI´s have been successfully analyzed, resulting in successful debugging and yield improvement. This paper first makes brief reviews of enhancement technologies, then reviews the recent trends in yield management systems, and finally reports on our systems, putting an emphasis on failure analysis technologies
  • Keywords
    expert systems; failure analysis; fault diagnosis; integrated circuit yield; integrated memory circuits; large scale integration; logic testing; MEMOFAN; MEMOFANEX; MEMOLINK; debugging; electron beam voltage image; expert-system-based memory cell failure cause; failure analysis; fault path; new generation LSI; pattern defects; peripheral circuitry failure locations; wafer processing step; yield management system; Condition monitoring; Etching; Image sampling; Light scattering; Optical films; Optical scattering; Optical sensors; Particle scattering; Shape; Throughput;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Statistical Metrology, 1997 2nd International Workshop on
  • Conference_Location
    Kyoto
  • Print_ISBN
    0-7803-3737-9
  • Type

    conf

  • DOI
    10.1109/IWSTM.1997.629400
  • Filename
    629400