Pseudospark discharge-based extreme-ultraviolet radiation source

This paper presents a study of the pseudospark and the optically triggered pseudospark (BLT) discharge devices as extreme-ultraviolet (EUV) radiation sources. Gas discharge-based EUV sources have potential as compact, robust, and less expensive alternatives, as compared with synchrotron sources and laser-produced plasmas. EUV emission within the 11-17 nm wavelength range is produced by a xenon pseudospark discharge plasma. The plasma was generated in a cylindrical-hollow-electrode geometry with a 3 mm diameter central through hole. The anode and the cathode were separated by a gap distance of 5 mm using a 44 mm o.d. pyrex glass envelope. A Si/Zr filter-coated photodiode was used to observe the EUV emission from the hollow anode side of the self-ignited plasma. UV light, generated from a xenon flash lamp, was incident on the back surface of the hollow cathode as an optical trigger for the pseudospark discharge