• DocumentCode
    3237778
  • Title

    Planar terminations in 4H-SiC Schottky diodes with low leakage and high yields

  • Author

    Singh, R. ; Palmour, J.W.

  • Author_Institution
    Cree Res. Inc., NC, USA
  • fYear
    1997
  • fDate
    26-29 May 1997
  • Firstpage
    157
  • Lastpage
    160
  • Abstract
    Various planar termination techniques were analyzed that extend the maximum blocking voltage in SIC devices while giving low leakage currents and high yields. Among various techniques analyzed, it was found that: guard ring termination is more effective than unterminated; field plate termination is more effective than guard ring termination; and field plate, double implanted field rings, single and double trench rings are similar in their effectiveness in the 500-800 V range. Single implanted field rings gave the highest average breakdown voltage as well as the highest voltage (805 V) device. While the yield among all devices was 22%, the yield among the ones with only a single implanted floating field ring was 67%
  • Keywords
    Schottky diodes; ion implantation; leakage currents; semiconductor device testing; semiconductor materials; silicon compounds; 500 to 800 V; Schottky diodes; SiC; average breakdown voltage; double implanted field rings; double trench rings; field plate termination; guard ring termination; leakage currents; planar terminations; yields; Availability; Boundary conditions; Breakdown voltage; Crystals; Epitaxial layers; Leakage current; Schottky diodes; Semiconductor diodes; Silicon carbide; Solid state circuits;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and IC's, 1997. ISPSD '97., 1997 IEEE International Symposium on
  • Conference_Location
    Weimar
  • ISSN
    1063-6854
  • Print_ISBN
    0-7803-3993-2
  • Type

    conf

  • DOI
    10.1109/ISPSD.1997.601459
  • Filename
    601459