• DocumentCode
    3238388
  • Title

    Design and fabrication of ultra-small GaAs Schottky barrier diodes for low-noise tetrahertz receiver applications

  • Author

    Peatman, William C B ; Crowe, Thomas W.

  • Author_Institution
    Virginia Univ., Charlottesville, VA, USA
  • fYear
    1989
  • fDate
    7-9 Aug 1989
  • Firstpage
    390
  • Lastpage
    398
  • Abstract
    The optimization of GaAs Schottky barrier mixer diodes for use in heterodyne receivers in the frequency range from 1-3 THz is investigated. The principal design rules are: (1) the substrate doping must be as high as possible to minimize series resistance; (2) the diode cutoff frequency must be increased as much as possible, which requires a small anode diameter and a higher epilayer doping density than has previously been used; and (3) the diode´s RF impedance must be made to match the impedance of the corner cube antenna, which requires a low junction capacitance. To achieve these goals, a nominal epilayer doping density of 5×1017 cm-3, an anode diameter of 0.5 μm, and the most highly doped substrate available (4.5×10 18 cm-3) were used. The diodes were fabricated with UV lithography and reactive ion etching. The resulting figure-of-merit cutoff frequency (10.6 THz) and zero-bias junction capacitance (0.4-0.5 fF) are both state of the art. The diodes have been RF-tested at 1.5 THz and yielded significant improvements in receiver sensitivity and reduced LO (local oscillator) power requirements
  • Keywords
    III-V semiconductors; Schottky-barrier diodes; gallium arsenide; mixers (circuits); superheterodyne receivers; 0.4 to 0.5 fF; 1 to 3 THz; 10.6 THz; GaAs barrier diodes; LO power requirement; RF impedance; RF testing; Schottky barrier mixer diodes; UV lithography; anode diameter; diode cutoff frequency; epilayer doping density; figure-of-merit cutoff frequency; heterodyne receivers; low-noise tetrahertz receiver; reactive ion etching; receiver sensitivity; semiconductor; substrate doping; zero-bias junction capacitance; Anodes; Capacitance; Cutoff frequency; Doping; Fabrication; Gallium arsenide; Impedance; Radio frequency; Schottky barriers; Schottky diodes;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    High Speed Semiconductor Devices and Circuits, 1989. Proceedings., IEEE/Cornell Conference on Advanced Concepts in
  • Conference_Location
    Ithaca, NY
  • Type

    conf

  • DOI
    10.1109/CORNEL.1989.79857
  • Filename
    79857