DocumentCode
3238464
Title
Discrimination of clustered defects on wafers using statistical methods
Author
Ikota, Mash ; Taguchi, Junichi ; Sugimoto, Aritoshi ; Sato, Hisako ; Masuda, Hiroo
Author_Institution
Device Dev. Center, Hitachi Ltd., Tokyo, Japan
fYear
1997
fDate
35589
Firstpage
52
Lastpage
55
Abstract
This paper presents a method for discrimination of clustered defects. The histogram of the number of defects per die is approximated to several major distributions. As a result, we found that Poisson distribution is almost equivalent to real data. The advantage of this method is that accurate coordinates are not required. Therefore it can be applied for almost all tools regardless of their accuracy of coordinates
Keywords
Poisson distribution; integrated circuit yield; statistical process control; IC yield; Poisson distribution; SPC; coordinate accuracy; discrimination; process monitoring; statistical methods; wafer clustered defects; Clustering algorithms; Distribution functions; Exponential distribution; Fabrication; Hardware; Histograms; Inspection; Monitoring; Process control; Statistical analysis;
fLanguage
English
Publisher
ieee
Conference_Titel
Statistical Metrology, 1997 2nd International Workshop on
Conference_Location
Kyoto
Print_ISBN
0-7803-3737-9
Type
conf
DOI
10.1109/IWSTM.1997.629412
Filename
629412
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