Title :
3.3 kV punchthrough IGBT with low loss and fast switching
Author :
Mori, M. ; Kobayashi, H. ; Saiki, T. ; Nagasu, M. ; Sakano, J. ; Saitou, R.
Author_Institution :
Res. Lab., Hitachi Ltd., Ibaraki, Japan
Abstract :
This paper presents a new punchthrough (PT) IGBT with a high blocking voltage of 3.3 kV. We numerically show that a high injection efficiency with a p+layer and local lifetime control in an n-layer are more effective in reducing the turn-on and turn-off losses, respectively. A p+epitaxial layer at the collector has been made in order to realize a high injection efficiency, which greatly reduced the turn-on loss, experimentally. When a local lifetime control technique is applied to this new PT IGBT, the turn-off loss is decreased by approximately 50% compared to a conventional PT IGBT with uniform lifetime control of electron irradiation. The new PT IGBT provides fast switching with rise and fall times of about 1 μs at 125°C. In addition, in this PT IGBT it is easy to apply a high resistivity n-layer without increasing its thickness or losing high blocking voltage in comparison with non-punchthrough (NPT) IGBT, which can get low failure rate (FIT) with cosmic ray
Keywords :
characteristics measurement; insulated gate bipolar transistors; losses; power transistors; semiconductor device models; 1 mus; 125 degC; 3.3 kV; blocking voltage; high resistivity n-layer; injection efficiency; local lifetime control; local lifetime control technique; punchthrough IGBT; switching times; turn-off losses; turn-on losses; Conductivity; Electrons; Epitaxial layers; Insulated gate bipolar transistors; Inverters; Laboratories; Motor drives; Power supplies; Rail transportation; Voltage;
Conference_Titel :
Power Semiconductor Devices and IC's, 1997. ISPSD '97., 1997 IEEE International Symposium on
Conference_Location :
Weimar
Print_ISBN :
0-7803-3993-2
DOI :
10.1109/ISPSD.1997.601479