Managing fab UHP N2 by measuring trace moisture

Author

Barth, Douglas C. ; Bolkenius, Marion ; Wagner, Matthew L. ; Cloarec, Jean-Luc

Author_Institution

Strategic Marketing, Pall Microelectron., Timonium, MD, USA

fYear

2015

fDate

3-6 May 2015

Firstpage

185

Lastpage

189

Abstract

TO MANAGE, YOU MUST MEASURE. In order to manage a fab´s ultrahigh purity (UHP) bulk N₂ gas supply, one must be able to measure its purity. In this study, Air Liquide used a new MEMS-based trace moisture analyzer from Pall, the Gaskleen® Pico1000 analyzer, to measure the moisture concentration in the bulk UHP N₂ supplied to two European semiconductor fabs. Moisture quality was confirmed at both fabs as being below 1 ppbv. The design of the gas sampling system (GSS) used to transport the N₂ to the analyzer was found to be critical for achieving accurate measurement. The Pico1000 analyzer was demonstrated to be accurate, robust, easy to use, and mobile.

Keywords

microsensors; moisture measurement; nitrogen; semiconductor device manufacture; Air Liquide; European semiconductor fabs; GSS; Gaskleen Pico1000 analyzer; MEMS-based trace moisture analyzer; N₂; Pall; UHP bulk nitrogen gas supply; fab ultrahigh purity bulk nitrogen gas supply; gas sampling system; moisture concentration; moisture quality; Instruments; Micromechanical devices; Moisture; Moisture measurement; Pollution measurement; Regulators; Semiconductor device measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Manufacturing Conference (ASMC), 2015 26th Annual SEMI

Conference_Location

Saratoga Springs, NY

Type

conf

DOI

10.1109/ASMC.2015.7164466

Filename

7164466