Title :
Blowback filtration for CVD vacuum pump protection
Author :
Ruth, Jochen ; Wagner, Matthew L. ; Heser, Gerd
Author_Institution :
Pall Microelectron., SLS Global Tech Support, Dreieich, Germany
Abstract :
Pall Microelectronics has used blowback filtration to protect a CVD vacuum installation at an European semiconductor fab. In cyclic regenerating blowback filtration, a powder cake builds up on the filter element and is periodically removed by gas blowback. In this application, the filter successfully removed SiOx particles formed in the foreleg of the pump. The reliability of the system is mainly dependent on the valves. They must repeatedly operate under harsh process conditions.
Keywords :
chemical vapour deposition; filtration; vacuum pumps; CVD vacuum pump protection; cyclic regenerating blowback filtration; gas blowback; powder cake; Filtration; Maintenance engineering; Media; Optical filters; Silicon; Solids; Valves;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference (ASMC), 2015 26th Annual SEMI
Conference_Location :
Saratoga Springs, NY
DOI :
10.1109/ASMC.2015.7164484
