Title :
On-product performance improvement via advanced litho-cluster control using integrated metrology and multi-layer overlay target
Author :
Bhattacharyya, Kaustuve ; Maassen, Martijn ; Schmitt-Weaver, Emil ; Tijssen, Robin ; Chen, Jackie ; Gin Hung
Author_Institution :
ASML, Veldhoven, Netherlands
Abstract :
Values of integrated metrology (IM) in high-volume manufacturing (HVM) have been a topic of discussion for over a decade. This publication finally brings the HVM data to take a fresh-look at the values of IM. A detail analysis was done using a very large amount of HVM data (2x-production node) in order to quantify both cycle time advantage and on-product overlay improvement benefits of IM. A significant work was done in order to understand the reasons behind these benefits and will be discussed in this publication.
Keywords :
integrated circuit measurement; lithography; semiconductor technology; HVM; advanced lithocluster control; high-volume manufacturing; integrated metrology; multilayer overlay target; Accuracy; Fingerprint recognition; Manufacturing; Metrology; Performance evaluation; Process control; Time measurement; APC; Integrated metrology; control; multi-layer target; overlay;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference (ASMC), 2015 26th Annual SEMI
Conference_Location :
Saratoga Springs, NY
DOI :
10.1109/ASMC.2015.7164503
