Title :
1999 International Conference on Simulation of Semiconductor Processes and Devices. SISPAD´99 (IEEE Cat. No.99TH8387)
Abstract :
The following topics were dealt with: circuit applications; device simulation; process modelling; heterodevice simulation; gate tunnelling; transport models; impurity modelling; interconnects; mesh generation
Keywords :
integrated circuit interconnections; ion implantation; semiconductor device models; semiconductor process modelling; tunnelling; circuit applications; device simulation; gate tunnelling; heterodevice simulation; impurity modelling; interconnects; mesh generation; process modelling; transport models;
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 1999. SISPAD '99. 1999 International Conference on
Conference_Location :
Kyoto, Japan
Print_ISBN :
4-930813-98-0
DOI :
10.1109/SISPAD.1999.799244
