DocumentCode :
3249800
Title :
Fabrication of Sub-Micron Surface Relief Gratings on the Azo-Polymer Films by a Low Zero-Order Diffraction Phase Mask
Author :
Cheng, Xusheng ; Wu, Wenxuan ; Luo, Yanhua ; Zhang, Qijin ; Zhu, Bing
Author_Institution :
Dept. of Electron. Eng. & Inf. Sci., Univ. of Sci. & Technol. of China, Hefei, China
fYear :
2009
fDate :
14-16 Aug. 2009
Firstpage :
1
Lastpage :
4
Abstract :
Azo-polymer materials had a large photoinduced refractive index and surface relief change. A sub-micron surface relief grating was fabricated directly by the irradiation of a UV pulse laser using a low zero-order diffraction phase mask. The effect of the zero-order diffraction of the phase mask was investigated. It suggested that the grating pattern formed by using the phase mask depended on the exposure time. Experimental results agree well with the theoretical analysis.
Keywords :
diffraction gratings; laser materials processing; optical fabrication; optical films; optical polymers; phase shifting masks; polymer films; refractive index; UV pulse laser irradiation; azo-polymer films; grating pattern formation; photoinduced refractive index; sub-micron surface relief grating fabrication; zero-order diffraction phase mask; Diffraction gratings; Distributed feedback devices; Fabrication; Interference; Optical diffraction; Optical films; Optical materials; Optical pulses; Optical surface waves; Polymer films;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photonics and Optoelectronics, 2009. SOPO 2009. Symposium on
Conference_Location :
Wuhan
Print_ISBN :
978-1-4244-4412-0
Type :
conf
DOI :
10.1109/SOPO.2009.5230063
Filename :
5230063
Link To Document :
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