Fabrication of Sub-Micron Surface Relief Gratings on the Azo-Polymer Films by a Low Zero-Order Diffraction Phase Mask

Author

Cheng, Xusheng ; Wu, Wenxuan ; Luo, Yanhua ; Zhang, Qijin ; Zhu, Bing

Author_Institution

Dept. of Electron. Eng. & Inf. Sci., Univ. of Sci. & Technol. of China, Hefei, China

fYear

2009

fDate

14-16 Aug. 2009

Firstpage

1

Lastpage

4

Abstract

Azo-polymer materials had a large photoinduced refractive index and surface relief change. A sub-micron surface relief grating was fabricated directly by the irradiation of a UV pulse laser using a low zero-order diffraction phase mask. The effect of the zero-order diffraction of the phase mask was investigated. It suggested that the grating pattern formed by using the phase mask depended on the exposure time. Experimental results agree well with the theoretical analysis.

Keywords

diffraction gratings; laser materials processing; optical fabrication; optical films; optical polymers; phase shifting masks; polymer films; refractive index; UV pulse laser irradiation; azo-polymer films; grating pattern formation; photoinduced refractive index; sub-micron surface relief grating fabrication; zero-order diffraction phase mask; Diffraction gratings; Distributed feedback devices; Fabrication; Interference; Optical diffraction; Optical films; Optical materials; Optical pulses; Optical surface waves; Polymer films;

fLanguage

English

Publisher

ieee

Conference_Titel

Photonics and Optoelectronics, 2009. SOPO 2009. Symposium on

Conference_Location

Wuhan

Print_ISBN

978-1-4244-4412-0

Type

conf

DOI

10.1109/SOPO.2009.5230063

Filename

5230063