DocumentCode
3249982
Title
A bulk-micromachined comb vibratory microgyroscope design
Author
Xiong, Xingguo ; Lu, Deren ; Wang, Weiyuan
Author_Institution
Dept. of Electr. & Comput. Eng., Cincinnati Univ., OH, USA
fYear
2005
fDate
7-10 Aug. 2005
Firstpage
151
Abstract
In this paper, DRIE (deep reactive ion etching) bulk-micromachined single-crystal silicon comb vibratory microgyroscope is introduced. The device uses glass as substrate so that parasitic capacitance can be alleviated. Due to DRIE technique the device thickness can be increased to be more than 100μm. The working principle of the microgyroscope is introduced. The dynamics analysis of the gyroscope is also performed. Based upon the analysis, an optimized microgyroscope design is proposed. The designed gyroscope is expected to have a sensitivity of 4nm/(°/sec).
Keywords
glass; gyroscopes; micromachining; micromechanical devices; sputter etching; DRIE process; bulk micromachining; comb vibratory microgyroscope; deep reactive ion etching; glass substrate; parasitic capacitance; Bonding; Electrostatics; Etching; Fingers; Glass; Gyroscopes; Micromechanical devices; Parasitic capacitance; Resonant frequency; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Circuits and Systems, 2005. 48th Midwest Symposium on
Print_ISBN
0-7803-9197-7
Type
conf
DOI
10.1109/MWSCAS.2005.1594061
Filename
1594061
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