DocumentCode :
3249982
Title :
A bulk-micromachined comb vibratory microgyroscope design
Author :
Xiong, Xingguo ; Lu, Deren ; Wang, Weiyuan
Author_Institution :
Dept. of Electr. & Comput. Eng., Cincinnati Univ., OH, USA
fYear :
2005
fDate :
7-10 Aug. 2005
Firstpage :
151
Abstract :
In this paper, DRIE (deep reactive ion etching) bulk-micromachined single-crystal silicon comb vibratory microgyroscope is introduced. The device uses glass as substrate so that parasitic capacitance can be alleviated. Due to DRIE technique the device thickness can be increased to be more than 100μm. The working principle of the microgyroscope is introduced. The dynamics analysis of the gyroscope is also performed. Based upon the analysis, an optimized microgyroscope design is proposed. The designed gyroscope is expected to have a sensitivity of 4nm/(°/sec).
Keywords :
glass; gyroscopes; micromachining; micromechanical devices; sputter etching; DRIE process; bulk micromachining; comb vibratory microgyroscope; deep reactive ion etching; glass substrate; parasitic capacitance; Bonding; Electrostatics; Etching; Fingers; Glass; Gyroscopes; Micromechanical devices; Parasitic capacitance; Resonant frequency; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Circuits and Systems, 2005. 48th Midwest Symposium on
Print_ISBN :
0-7803-9197-7
Type :
conf
DOI :
10.1109/MWSCAS.2005.1594061
Filename :
1594061
Link To Document :
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