A 3-dimensional process-simulator based on an open architecture

Author

Wada, Tetsunori ; Umimoto, Hiroyuki ; Fujinaga, Masato ; Kimura, Mitsunori ; Uchida, Tetsuya ; Suzuki, Kaina ; Akiyama, Yutaka ; Hane, Masami ; Takenaka, Masahiro ; Miura, Noriyuki ; Kotani, Norihiko

Author_Institution

Adv. Technol. Res. Dept., Semicond. Leading Edge Technol. Inc., Yokohama, Japan

fYear

1999

fDate

1999

Firstpage

127

Lastpage

130

Abstract

A 3-dimensional process simulator based on an open architecture has been designed. A C++ like input language is designed to flexibly control process flow and to easily add user designed function. A self explaining data file format and its input/output C++ libraries are developed to ensure data exchange between the user´s data file and HySyProS by using C++ class libraries. Several classes for discretizing and assembling drift-diffusion equations are developed for testing diffusion models efficiently

Keywords

C++ language; object-oriented programming; open systems; semiconductor process modelling; technology CAD (electronics); C++ like input language; HySyProS; diffusion models; drift-diffusion equations; open architecture; self explaining data file format; three-dimensional process-simulator; user designed functions; Analytical models; Assembly; Equations; Etching; Lead compounds; Libraries; Oxidation; Process control; Testing; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Simulation of Semiconductor Processes and Devices, 1999. SISPAD '99. 1999 International Conference on

Conference_Location

Kyoto

Print_ISBN

4-930813-98-0

Type

conf

DOI

10.1109/SISPAD.1999.799277

Filename

799277