DocumentCode
3250210
Title
Effect of the tunneling rates on the conductance characteristics of single-electron transistors
Author
Scholze, A. ; Schenk, A. ; Fichtner, W.
Author_Institution
Integrated Syst. Labs., Eidgenossische Tech. Hochschule, Zurich, Switzerland
fYear
1999
fDate
1999
Firstpage
171
Lastpage
174
Abstract
We present calculations of the linear-response conductance of a SiGe based single electron transistor (SET). The tunneling rates through the source- and lead barriers are calculated using Bardeen´s transfer Hamiltonian formalism (1961). The tunneling matrix elements are calculated for transitions between the 0D states in the quantum dot and the lowest subband in the 1D constriction. We compare the results for the conductance peaks with those from calculations with a constant rate, i.e., where the shape of the peaks is only due to energetic arguments
Keywords
Ge-Si alloys; semiconductor materials; single electron transistors; tunnelling; 1D subband; SiGe; linear response conductance; matrix element; quantum dot; single electron transistor; transfer Hamiltonian; tunneling rate; Germanium silicon alloys; Laboratories; Nanoscale devices; Quantum dots; Reservoirs; Shape; Silicon germanium; Single electron transistors; Statistics; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices, 1999. SISPAD '99. 1999 International Conference on
Conference_Location
Kyoto
Print_ISBN
4-930813-98-0
Type
conf
DOI
10.1109/SISPAD.1999.799288
Filename
799288
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