DocumentCode :
3250543
Title :
Transient electro-thermal analysis of dynamic punch-through in SiC power devices
Author :
Kaindl, W. ; Lades, M. ; Wachutka, G.
Author_Institution :
Inst. for Phys. of Electrotech., Tech. Univ. Munchen, Germany
fYear :
1999
fDate :
1999
Firstpage :
231
Lastpage :
234
Abstract :
Because of its rather large ionization energies compared to Si, dopants of SiC have larger ionization time constants. Therefore, dynamically enlarged space charge regions, eventually resulting in a punch-through (PT) situation in certain device structures, can easily occur. The detailed numerical analysis presented in this paper shows that the high currents caused by PT are able to destroy SiC power devices. As a consequence, the effect of dynamic PT has to be taken into account designing SiC devices
Keywords :
current density; junction gate field effect transistors; numerical analysis; power MOSFET; power field effect transistors; semiconductor device models; silicon compounds; space charge; transient analysis; wide band gap semiconductors; SiC; SiC power devices; current density; current transients; dynamic punch-through; dynamically enlarged depletion regions; dynamically enlarged space charge regions; extended drift-diffusion model; ionization energies; ionization time constants; modeling; numerical analysis; power JFETs; power MOSFETs; transient electro-thermal analysis; Charge carrier processes; Electron emission; Ionization; Power measurement; Semiconductor process modeling; Silicon carbide; Temperature; Time measurement; Transient analysis; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 1999. SISPAD '99. 1999 International Conference on
Conference_Location :
Kyoto
Print_ISBN :
4-930813-98-0
Type :
conf
DOI :
10.1109/SISPAD.1999.799303
Filename :
799303
Link To Document :
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