DocumentCode
3250738
Title
Low voltage silicon field emitters with gold gates
Author
Trujillo, J.T. ; Chakhovskoi, A. ; Hunt, C.E.
Author_Institution
Dept. of Electr. & Comput. Eng., California Univ., Davis, CA, USA
fYear
1995
fDate
July 30 1995-Aug. 3 1995
Firstpage
42
Lastpage
46
Abstract
Gated silicon field emission cathodes have been fabricated by the self-aligned lift-off method. The addition of a gold gate not only simplifies processing, but also facilitates easy packaging and allows the placement of many devices on a single chip. Currents have been measured on 2500 tip arrays which follow Fowler-Nordheim characteristics over several decades. Field emission from these arrays begins at less than 20 V. Low frequency noise measurements exhibit spectral power density indices from 1.18 to 1.55. Single tip and small array devices are being characterized.
Keywords
cathodes; chromium; electron field emission; elemental semiconductors; gold; semiconductor device noise; silicon; vacuum microelectronics; Fowler-Nordheim characteristics; Si-Cr-Au; electron field emission; gated field emission cathodes; low frequency noise measurements; packaging; self-aligned lift-off method; small array devices; spectral power density indices; tip arrays; vacuum microelectronics; Cathodes; Current measurement; Density measurement; Gold; Low voltage; Low-frequency noise; Packaging; Power measurement; Semiconductor device measurement; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 1995. IVMC., 1995 International
Conference_Location
Portland, OR, USA
Print_ISBN
0-7803-2143-X
Type
conf
DOI
10.1109/IVMC.1995.486986
Filename
486986
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