• DocumentCode
    3250738
  • Title

    Low voltage silicon field emitters with gold gates

  • Author

    Trujillo, J.T. ; Chakhovskoi, A. ; Hunt, C.E.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., California Univ., Davis, CA, USA
  • fYear
    1995
  • fDate
    July 30 1995-Aug. 3 1995
  • Firstpage
    42
  • Lastpage
    46
  • Abstract
    Gated silicon field emission cathodes have been fabricated by the self-aligned lift-off method. The addition of a gold gate not only simplifies processing, but also facilitates easy packaging and allows the placement of many devices on a single chip. Currents have been measured on 2500 tip arrays which follow Fowler-Nordheim characteristics over several decades. Field emission from these arrays begins at less than 20 V. Low frequency noise measurements exhibit spectral power density indices from 1.18 to 1.55. Single tip and small array devices are being characterized.
  • Keywords
    cathodes; chromium; electron field emission; elemental semiconductors; gold; semiconductor device noise; silicon; vacuum microelectronics; Fowler-Nordheim characteristics; Si-Cr-Au; electron field emission; gated field emission cathodes; low frequency noise measurements; packaging; self-aligned lift-off method; small array devices; spectral power density indices; tip arrays; vacuum microelectronics; Cathodes; Current measurement; Density measurement; Gold; Low voltage; Low-frequency noise; Packaging; Power measurement; Semiconductor device measurement; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 1995. IVMC., 1995 International
  • Conference_Location
    Portland, OR, USA
  • Print_ISBN
    0-7803-2143-X
  • Type

    conf

  • DOI
    10.1109/IVMC.1995.486986
  • Filename
    486986