Microscopic characterization of field emitter array structure and work function by scanning Maxwell-stress microscopy

Microscopic images of both the structures and surface potentials of various field emitter arrays (FEAs) were measured by scanning Maxwell-stress microscopy (SMM). Results of SMM measurements clearly showed nanometre-scale irregularities in the structures and structure-related surface potential distributions. From these results, work-function values have been derived for various emitter materials such as Si, Cr, Mo, W, etc. by using an Au film as a reference material; workfunction of Au was assumed as 5.1 eV. Experimental procedure and results are described in detail.