DocumentCode
3252102
Title
Micro-patterned polycrystalline diamond field emitter diode arrays
Author
Kang, W.P. ; Davidson, J.L. ; Howell, M. ; Bhuva, B. ; Kinser, D.L. ; Li, Q. ; Xu, J.F.
Author_Institution
Dept. of Appl. & Eng. Sci., Vanderbilt Univ., Nashville, TN, USA
fYear
1995
fDate
July 30 1995-Aug. 3 1995
Firstpage
287
Lastpage
291
Abstract
Electron field emission from an array of patterned pyramids of polycrystalline diamond for vacuum diode applications has been investigated. High current emission from the patterned diamond microtip arrays was obtained at low electric fields. An emission current from the diamond microtips of 0.1 mA was observed for a field of <10 V//spl mu/m. Field emission for these diamond microtips exhibits significant enhancement both in total emission current and stability compared to pure silicon emitters. Moreover, field emission from patterned polycrystalline diamond pyramidal tip arrays is unique in that the applied field is found to be lower compared to that required for emission from Si, Ge, GaAs, and metal surfaces. The fabrication process utilizing silicon shaping and micromachining techniques for the fabrication of diamond diaphragms with diamond microtip arrays for vacuum microelectronic applications has been developed. The processing techniques are compatible with IC fabrication technology. The effect of temperature annealing on the current emission characteristics was also investigated.
Keywords
annealing; cathodes; diamond; diaphragms; diodes; electron field emission; vacuum microelectronics; vacuum tubes; C; current emission characteristics; diaphragms; electron field emission; field emitter diode arrays; micro-patterned polycrystalline diamond; micromachining techniques; pyramidal tip arrays; temperature annealing; total emission current; vacuum diode applications; vacuum microelectronic applications; Diodes; Electron emission; Fabrication; Field emitter arrays; Gallium arsenide; Microelectronics; Micromachining; Silicon; Stability; Vacuum technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 1995. IVMC., 1995 International
Conference_Location
Portland, OR, USA
Print_ISBN
0-7803-2143-X
Type
conf
DOI
10.1109/IVMC.1995.487051
Filename
487051
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