DocumentCode :
3252111
Title :
Field emission measurements with /spl mu/m resolution on CVD-polycrystalline diamond films
Author :
Pupeter, N. ; Gohl, A. ; Habermann, Thomas ; Mahner, E. ; Piel, H. ; Niedermann, P. ; Hanni, W.
Author_Institution :
Fachbereich Phys., Bergische Univ., Wuppertal, Germany
fYear :
1995
fDate :
July 30 1995-Aug. 3 1995
Firstpage :
292
Lastpage :
296
Abstract :
We have investigated the distribution of field emitting sites on polycrystalline diamond films at electrical surface fields between 2.5 and 150 MV/m by means of a Field Emission Scanning Microscope with /spl mu/m resolution. For the first time field emission scans were performed on broad-area (/spl ap/cm/sup 2/) diamond cathodes with in situ scanning electron microscope analysis of the localized sites. The 2-3 /spl mu/m thick diamond films were chemical vapor deposited on Mo substrates by the hot-filament technique. Undoped and p-type boron doped films with low content of sp/sup 2/-bonded carbons were studied. The highest emitter density of 800/cm/sup 2/ at 100 MV/m was detected on undoped diamond surfaces. A preliminary study of localized emitters indicated both sporadic particles of foreign materials at the emitting sites as well as intrinsic emission from diamond. In addition, the Fowler-Nordheim parameters /spl beta/ and S, the elemental composition, and the current stability of localized emitters were measured.
Keywords :
cathodes; chemical vapour deposition; cold-cathode tubes; diamond; electron field emission; elemental semiconductors; scanning electron microscopy; semiconductor thin films; vacuum microelectronics; 2 to 3 micron; C-Mo; CVD-polycrystalline diamond films; Fowler-Nordheim parameters; Mo; cathodes; current stability; electrical surface fields; electron field emission measurements; elemental composition; emitter density; emitting sites; field emission scanning microscope; hot-filament technique; intrinsic emission; localized emitters; scanning electron microscope analysis; vacuum microelectronics; Anodes; Cathodes; Current measurement; Electrodes; Iron; Regulators; Scanning electron microscopy; Spatial resolution; Surface morphology; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1995. IVMC., 1995 International
Conference_Location :
Portland, OR, USA
Print_ISBN :
0-7803-2143-X
Type :
conf
DOI :
10.1109/IVMC.1995.487052
Filename :
487052
Link To Document :
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