• DocumentCode
    3252389
  • Title

    Novel Process Combining SOI and Strained Circuitry

  • Author

    Belfordab, R. ; Xu, Qing ; Sood, Sumant ; Acosta, Antonio ; Thrift, Alan ; Zell, Jordan ; Bosworth, Lloyd

  • Author_Institution
    Belford Res. Inc.
  • fYear
    2006
  • fDate
    2-5 Oct. 2006
  • Firstpage
    49
  • Lastpage
    50
  • Abstract
    In this work the authors use the most accurate measurement of strain, which is the direct (%) elongation of the polyimide carrier. This is the only appropriate method of reporting mechanical-stress induced elongation. Improvement in n-type has been calculated to be a maximum at 1.2% biaxial strains (Rim et al., 2002). The authors have observed optima at much lesser strain values by direct measurement. Anisotropic straining can be optimized to further reduce the total 3-D strain; out-of-plane compressive and in-plane tensile strain. In this way the defect problems common in biaxially strained substrates can be avoided
  • Keywords
    MOSFET; elongation; silicon-on-insulator; strain measurement; 3D strain; MOSFET; SOI; anisotropic straining; in-plane tensile strain; mechanical-stress induced elongation; out-of-plane compressive strain; polyimide carrier; strain measurement; strained circuitry; Biomembranes; Capacitive sensors; Circuits; MOSFETs; Polymers; Silicon on insulator technology; Strain measurement; Stress; Tensile strain; Wafer bonding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    International SOI Conference, 2006 IEEE
  • Conference_Location
    Niagara Falls, NY
  • ISSN
    1078-621X
  • Print_ISBN
    1-4244-0289-1
  • Electronic_ISBN
    1078-621X
  • Type

    conf

  • DOI
    10.1109/SOI.2006.284427
  • Filename
    4062875