• DocumentCode
    3253147
  • Title

    Experiments of highly emissive MOS electron tunneling cathode

  • Author

    Yokoo, K. ; Koshita, G. ; Hanzawa, S. ; Abe, Y.

  • Author_Institution
    Res. Inst. of Electr. Commun., Tohoku Univ., Sendai, Japan
  • fYear
    1995
  • fDate
    July 30 1995-Aug. 3 1995
  • Firstpage
    494
  • Lastpage
    498
  • Abstract
    An effective mean-free-path of hot electrons in the conduction band of SiO/sub 2/ in a Si-gate MOS cathode was measured first and was about 0.7 nm. Following these observations, we proposed and fabricated a depletion gate MOS electron tunneling cathode. The highest transfer ratio of 13.3% was achieved in the cathode at the low emission current level, which was considerably higher than that of tunneling cathodes studied in the past. However, the ratio decreased drastically at high current due to the hole injection into the depletion region from the gate.
  • Keywords
    MIS devices; cathodes; electron field emission; elemental semiconductors; hot carriers; silicon; silicon compounds; tunnelling; vacuum microelectronics; MOS electron tunneling cathode; Si-SiO/sub 2/; conduction band; depletion gate; depletion region; effective mean-free-path; emission current level; hole injection; hot electrons; transfer ratio; vacuum microelectronics; Acceleration; Cathodes; Diodes; Electron beams; Electron emission; Elementary particle vacuum; Microelectronics; Scattering; Tellurium; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 1995. IVMC., 1995 International
  • Conference_Location
    Portland, OR, USA
  • Print_ISBN
    0-7803-2143-X
  • Type

    conf

  • DOI
    10.1109/IVMC.1995.487098
  • Filename
    487098