Title :
An electron beam microcolumn for multi-beam applications
Author :
Kratschmer, E. ; Kim, H.S. ; Thomson, M.G.R. ; Lee, K.Y. ; Rishton, S.A. ; Yu, M.L. ; Chang, T.H.P.
Author_Institution :
IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
fDate :
July 30 1995-Aug. 3 1995
Abstract :
Summary form only given. Highly miniaturized electron beam columns based on a field emission source and microfabricated electron optical components have been developed. A 1 keV microcolumn operating with a miniaturized Zr/O/W Schottky emitter has been successfully evaluated for the first time. This paper will present the results obtained with the new microcolumn and discuss present efforts to further improve column performance with respect to resolution, beam current, and deflection field size.
Keywords :
electron beams; electron optics; 1 keV; Zr-O-W; Zr/O/W Schottky emitter; electron beam microcolumn; electron optical components; field emission source; microfabrication; multibeam applications; Biomembranes; Electrodes; Electron beams; Electron emission; Inspection; Optical devices; System testing; Zirconium;
Conference_Titel :
Vacuum Microelectronics Conference, 1995. IVMC., 1995 International
Conference_Location :
Portland, OR, USA
Print_ISBN :
0-7803-2143-X
DOI :
10.1109/IVMC.1995.487106
