Title :
IEE Colloquium on `Silicon Today´ (Digest No.068)
Abstract :
The following topics were dealt with: Si for flat panel displays; intrinsic polycrystalline Si thin-film transistors; plasma grown oxides on single crystal and amorphous Si substrates; micron scale machining; characterisation of polycrystalline SiC films for heterojunction emitter applications; waveguide technology for Si photonic circuits; Si low dimensional structures; silicon funding in the UK via SERC/DTI
Keywords :
elemental semiconductors; integrated optoelectronics; plasma deposition; semiconductor technology; semiconductor thin films; silicon; thin film transistors; SERC/DTI; Si; Si low dimensional structures; Si photonic circuits; SiC films; UK; amorphous Si substrates; flat panel displays; heterojunction emitter; micron scale machining; plasma grown oxides; polycrystalline film characterisation; semiconductors; silicon funding; single crystal substrates; thin-film transistors; waveguide technology;
Conference_Titel :
Silicon Today, IEE Colloquium on
Conference_Location :
London
