Title :
Studies on H2O-based Al2O3 deposited on as-grown CVD graphene
Author :
Wenrong Wang ; Chen Liang ; Tie Li ; Yuelin Wang
Author_Institution :
State Key Labs. of Transducer Technol., Shanghai Inst. of Microsyst. & Inf. Technol., Shanghai, China
Abstract :
In this paper, graphene films were synthesized by chemical vapor deposition. Raman spectra and transmission electron microscope indicated the graphene films were few-layer. Al2O3 films were grown directly onto the surface of graphene transferred on SiO2/Si by H2O-based atomic layer deposition method. Experiments revealed that the distribution of physically adsorbed H2O molecules on the surface of graphene decided the morphology of Al2O3 film, and the O/Al ratio was close to stoichiometric condition of 1.5.
Keywords :
Raman spectra; aluminium compounds; atomic layer deposition; chemical vapour deposition; graphene; thin films; transmission electron microscopy; C; CVD; H2O-Al2O3; Raman spectra; atomic layer deposition; chemical vapor deposition; graphene films; physically adsorbed molecules; transmission electron microscopy; Aluminum oxide; Atomic layer deposition; Decision support systems; Graphene; Silicon; Al2O3; atomic layer deposition (ALD); chemical vapor deposition (CVD); graphene;
Conference_Titel :
Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), 2013 International Conference on
Conference_Location :
Suzhou
Print_ISBN :
978-1-4799-1210-0
DOI :
10.1109/3M-NANO.2013.6737390
