• DocumentCode
    3258866
  • Title

    On the performance of double-gate MOSFET circuit applications

  • Author

    Hassoune, Ilham ; O´Connor, Ian ; Navarro, David

  • Author_Institution
    Lyon Inst. of Nanotechnol., Ecole Centrale de Lyon, Ecully
  • fYear
    2007
  • fDate
    5-8 Aug. 2007
  • Firstpage
    558
  • Lastpage
    561
  • Abstract
    In this paper, we carry out a quantitative analysis of the performance of Double-Gate (DG) MOSFET circuit applications through various benchmark structures (NAND cell, ring oscillator and voltage controlled oscillator). Simulation results in double-gate fully depleted SOI/CMOS technology of the considered benchmarks under Vdd=1.2 V have shown that design with connected gates outperforms design with independent gate control with regard to speed and die area, while design with independent gate control is more appropriate for managing both dynamic and static power.
  • Keywords
    MOSFET; MOSFET circuits; silicon-on-insulator; CMOS technology; SOI; double-gate MOSFET circuit; independent gate control; CMOS technology; Circuit simulation; Energy management; MOSFET circuits; Nanotechnology; Parasitic capacitance; Performance analysis; Ring oscillators; Threshold voltage; Voltage-controlled oscillators;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Circuits and Systems, 2007. NEWCAS 2007. IEEE Northeast Workshop on
  • Conference_Location
    Montreal, Que
  • Print_ISBN
    978-1-4244-1163-4
  • Electronic_ISBN
    978-1-4244-1164-1
  • Type

    conf

  • DOI
    10.1109/NEWCAS.2007.4487973
  • Filename
    4487973