DocumentCode
3258866
Title
On the performance of double-gate MOSFET circuit applications
Author
Hassoune, Ilham ; O´Connor, Ian ; Navarro, David
Author_Institution
Lyon Inst. of Nanotechnol., Ecole Centrale de Lyon, Ecully
fYear
2007
fDate
5-8 Aug. 2007
Firstpage
558
Lastpage
561
Abstract
In this paper, we carry out a quantitative analysis of the performance of Double-Gate (DG) MOSFET circuit applications through various benchmark structures (NAND cell, ring oscillator and voltage controlled oscillator). Simulation results in double-gate fully depleted SOI/CMOS technology of the considered benchmarks under Vdd=1.2 V have shown that design with connected gates outperforms design with independent gate control with regard to speed and die area, while design with independent gate control is more appropriate for managing both dynamic and static power.
Keywords
MOSFET; MOSFET circuits; silicon-on-insulator; CMOS technology; SOI; double-gate MOSFET circuit; independent gate control; CMOS technology; Circuit simulation; Energy management; MOSFET circuits; Nanotechnology; Parasitic capacitance; Performance analysis; Ring oscillators; Threshold voltage; Voltage-controlled oscillators;
fLanguage
English
Publisher
ieee
Conference_Titel
Circuits and Systems, 2007. NEWCAS 2007. IEEE Northeast Workshop on
Conference_Location
Montreal, Que
Print_ISBN
978-1-4244-1163-4
Electronic_ISBN
978-1-4244-1164-1
Type
conf
DOI
10.1109/NEWCAS.2007.4487973
Filename
4487973
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