• DocumentCode
    3259393
  • Title

    Composition changes in sputter deposition of Y-Ba-Cu-O films

  • Author

    Hoshi, Y. ; Naoe, M.

  • Author_Institution
    Tokyo Institute of Polytechnics
  • fYear
    1989
  • fDate
    28-31 March 1989
  • Keywords
    Electron emission; Kinetic energy; Plasma temperature; Silicon; Sputtering; Substrates; Yttrium barium copper oxide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Magnetics Conference, 1989. Digests of INTERMAG '89., International
  • Conference_Location
    Washington, DC, USA
  • Type

    conf

  • DOI
    10.1109/INTMAG.1989.690055
  • Filename
    690055