Fabrication of micro- and nano- structures for antireflection by chemical etching method

Author

Rong, Chunming ; Gu, X.-Y. ; Liu, W.-P. ; Zhang, Wensheng ; Zhang, Fang ; Yuan, Lei ; Wang, Y.Y. ; Peng, C.S.

Author_Institution

Inst. of Inf. Opt. Eng., Soochow Univ., Suzhou, China

fYear

2013

fDate

26-30 Aug. 2013

Firstpage

368

Lastpage

371

Abstract

Periodic pyramid and random nanostructure binary structures of single-crystal silicon wafer was fabricated by chemical etching method. Much lower reflectance of silicon wafer with these structures was obtained compared with that of single pyramid arrays. The morphology and reflectivity of these structures, as well as the influence on nanostructures caused by rapid thermal annealing (RTA) time and temperature of gold film, were studied. An average reflectance of 1.97% was obtained under optimized condition.

Keywords

elemental semiconductors; etching; infrared spectra; nanofabrication; nanostructured materials; periodic structures; semiconductor growth; silicon; ultraviolet spectra; visible spectra; RTA; Si; chemical etching method; gold film; morphology; nanostructured materials; periodic pyramid structures; rapid thermal annealing; reflectivity; single-crystal silicon wafer; Etching; Fabrication; Gold; Reflectivity; Silicon; Surface morphology; etching; periodic pyramid; random nanostructure; rapid thermal annealing; reflectance;

fLanguage

English

Publisher

ieee

Conference_Titel

Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), 2013 International Conference on

Conference_Location

Suzhou

Print_ISBN

978-1-4799-1210-0

Type

conf

DOI

10.1109/3M-NANO.2013.6737452

Filename

6737452