DocumentCode
3261439
Title
Improved Characteristics of 4H-SiC MESFET with Multi-recessed Drift Region
Author
Chen, Zhuangliang ; Deng, Xiaochuan ; Luo, Xiaorong ; Zhang, Bo ; Li, Zhaoji
Author_Institution
State key Laboratory of Electronic Thin Films and Integrated Devices, Chengdu, Sichuan, 610054, China
fYear
2007
fDate
3-4 June 2007
Firstpage
82
Lastpage
85
Abstract
4H-SiC MESFET with multi-recessed drift region is proposed and the DC and RF characteristics are analyzed in this paper by 2D numerical simulation. The simulated results show that the breakdown voltage is about 68% larger than that of the conventional structure. The calculated maximum output power density at operation point VGS=-10V, VDS=40V are 9.6W/mm and 6.2W/mm respectively for 4H-SiC MESFETs with multi-recessed drift region structure and conventional structure. The multi-recesses eliminate the spaces adjacent to gate and stopped the depletion region extending towards drain and source. Compared to the conventional structure, the gate-source capacitance (CGS) and drain-gate capacitance (CDG) of multi-recessed drift region structure have both been reduced, which will result in a superior RF performance.
Keywords
Capacitance; Doping; Electric breakdown; Laboratories; MESFETs; Power generation; Radio frequency; Silicon carbide; Thermal conductivity; Thin film devices; 4H-SiC; DC and RF characteristics; MESFET; multi-recesses;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices and Semiconductor Technology, 2007. EDST 2007. Proceeding of 2007 International Workshop on
Conference_Location
Tsinghua University
Print_ISBN
1-4244-1098-3
Electronic_ISBN
1-4244-1098-3
Type
conf
DOI
10.1109/EDST.2007.4289783
Filename
4289783
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