• DocumentCode
    3261439
  • Title

    Improved Characteristics of 4H-SiC MESFET with Multi-recessed Drift Region

  • Author

    Chen, Zhuangliang ; Deng, Xiaochuan ; Luo, Xiaorong ; Zhang, Bo ; Li, Zhaoji

  • Author_Institution
    State key Laboratory of Electronic Thin Films and Integrated Devices, Chengdu, Sichuan, 610054, China
  • fYear
    2007
  • fDate
    3-4 June 2007
  • Firstpage
    82
  • Lastpage
    85
  • Abstract
    4H-SiC MESFET with multi-recessed drift region is proposed and the DC and RF characteristics are analyzed in this paper by 2D numerical simulation. The simulated results show that the breakdown voltage is about 68% larger than that of the conventional structure. The calculated maximum output power density at operation point VGS=-10V, VDS=40V are 9.6W/mm and 6.2W/mm respectively for 4H-SiC MESFETs with multi-recessed drift region structure and conventional structure. The multi-recesses eliminate the spaces adjacent to gate and stopped the depletion region extending towards drain and source. Compared to the conventional structure, the gate-source capacitance (CGS) and drain-gate capacitance (CDG) of multi-recessed drift region structure have both been reduced, which will result in a superior RF performance.
  • Keywords
    Capacitance; Doping; Electric breakdown; Laboratories; MESFETs; Power generation; Radio frequency; Silicon carbide; Thermal conductivity; Thin film devices; 4H-SiC; DC and RF characteristics; MESFET; multi-recesses;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Semiconductor Technology, 2007. EDST 2007. Proceeding of 2007 International Workshop on
  • Conference_Location
    Tsinghua University
  • Print_ISBN
    1-4244-1098-3
  • Electronic_ISBN
    1-4244-1098-3
  • Type

    conf

  • DOI
    10.1109/EDST.2007.4289783
  • Filename
    4289783