DocumentCode :
3261635
Title :
Preparation and characterization for B3.15Nd0.85Ti3O12 thin film by sol-gel process
Author :
Zang, Yong-yuan ; Xie, Dan ; Xiao, Ye-hui ; Xue, Kan-Hao ; Ren, Tian-Ling ; Liu, Li-Tian
Author_Institution :
Institute of Microelectronics, Tsinghua University, Beijing, 100084, China
fYear :
2007
fDate :
3-4 June 2007
Firstpage :
121
Lastpage :
124
Abstract :
B3.15Nd0.85Ti3O12 (BNdT) thin films were prepared on Pt(100)/Ti/SiO2/Si(100) substrate by sol-gel process. Dense and uniform films were achieved by rapidly thermal annealing at 750°C. The perovskite crystalline and the microstructure of the thin films were investigated by XRD, SEM, and AFM. The BNdT thin film capacitors with a Pt electrode show excellent ferroelectric properties. Well-saturated polarization-electric field (P-E) switching curves were examined in the BNdT thin films. The remanent polarization and the coercive field were 43¿C/cm2 and 66kv/cm at an applied voltage of 8v, respectively, in the films annealed at 750°C. The dielectric constant and the dissipation factor were 583 and 0.07 respectively, measured at 100KHZ.
Keywords :
Capacitors; Crystal microstructure; Crystallization; Ferroelectric films; Polarization; Rapid thermal annealing; Rapid thermal processing; Substrates; Transistors; X-ray scattering; Ferroelectric films; bismuth compounds; ferroelectric materials; ferroelectric memories; polarization;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Semiconductor Technology, 2007. EDST 2007. Proceeding of 2007 International Workshop on
Conference_Location :
Tsinghua University
Print_ISBN :
1-4244-1098-3
Electronic_ISBN :
1-4244-1098-3
Type :
conf
DOI :
10.1109/EDST.2007.4289793
Filename :
4289793
Link To Document :
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