DocumentCode :
3264584
Title :
Effects Of Hydrogen Annealing On Data Retention Time For High Density Drams
Author :
Hsia, L.C. ; Chang, Thomas ; Chang, S.J. ; Fan, D. ; Wei, H.Y. ; Jan, Jack
fYear :
1997
fDate :
3-5 June 1997
Firstpage :
142
Lastpage :
147
Keywords :
Annealing; Dielectric substrates; Diodes; Gettering; Hydrogen; Leakage current; Lifting equipment; Random access memory; Silicon; Tail;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, Systems, and Applications, 1997. Proceedings of Technical Papers. 1997 International Symposium on
Conference_Location :
Taipei, Taiwan
ISSN :
1524-766X
Print_ISBN :
0-7803-4131-7
Type :
conf
DOI :
10.1109/VTSA.1997.614746
Filename :
614746
Link To Document :
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