• DocumentCode
    3264852
  • Title

    New innovations in non-volatile memory technology

  • Author

    Liu, Rich

  • Author_Institution
    Macronix Int. Co. Ltd, Hsinchu, Taiwan
  • Volume
    1
  • fYear
    2004
  • fDate
    18-21 Oct. 2004
  • Firstpage
    673
  • Abstract
    Non-volatile memory has become one of the fastest growing markets because of increasing applications ranging from mobile communication to digital still and video cameras. Over 90°o of NVM memory shipped today uses floating gate devices. However, the need for data retention dictates that the tunneling oxide must be thicker than about 7nm. Consequently, floating gate devices face severe scaling challenges below ∼90nm node. Facing this seemingly insurmountable barrier, many potential solutions are being developed to continue the Moore´s law path. These range from multiple bits per physical device (e.g. MLC and NBit) to new materials and new devices (e.g. MRAM and phase-change memory). Each new technology has its own promises and challenges. This work attempts to present a comprehensive analysis of new approaches and to elucidate future NVM scenarios beyond 90nm node.
  • Keywords
    nanotechnology; random-access storage; MRAM; Moore law; data retention; digital still camera; floating gate devices; mobile communication; nonvolatile memory technology; phase-change memory; tunneling oxide; video camera; Electrons; Logic; Mobile communication; Moore´s Law; Nonvolatile memory; SONOS devices; Silicon; Technological innovation; Threshold voltage; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
  • Print_ISBN
    0-7803-8511-X
  • Type

    conf

  • DOI
    10.1109/ICSICT.2004.1435094
  • Filename
    1435094