• DocumentCode
    3265085
  • Title

    Integrated Ferroelectric Technology For Nonvolatile

  • Author

    Sumi, Tatsumi

  • fYear
    1997
  • fDate
    3-5 June 1997
  • Firstpage
    157
  • Lastpage
    161
  • Keywords
    CMOS process; Conducting materials; EPROM; Electrodes; Ferroelectric materials; Nonvolatile memory; Random access memory; Stress; Switches; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, Systems, and Applications, 1997. Proceedings of Technical Papers. 1997 International Symposium on
  • Conference_Location
    Taipei, Taiwan
  • ISSN
    1524-766X
  • Print_ISBN
    0-7803-4131-7
  • Type

    conf

  • DOI
    10.1109/VTSA.1997.614749
  • Filename
    614749