Title :
Ultra-thin Nitride/oxide Stack Dielectric Produced By In-situ Jet Vapor Deposition
Author :
Shi, Y. ; Wang, X.W. ; Ma, T.P. ; Cui, G.J. ; Tamagawa, T. ; Halpern, B.L. ; Schmitt, J.J.
Keywords :
Chemical vapor deposition; Dielectric substrates; Furnaces; High-K gate dielectrics; Leakage current; Oxidation; Random access memory; Silicon; Tunneling; Voltage;
Conference_Titel :
VLSI Technology, Systems, and Applications, 1997. Proceedings of Technical Papers. 1997 International Symposium on
Conference_Location :
Taipei, Taiwan
Print_ISBN :
0-7803-4131-7
DOI :
10.1109/VTSA.1997.614752
