Ultra-thin Oxide With Atomically Smooth Interfaces

Author

Chin, A. ; Chen, W.J. ; Kao, R.H. ; Lin, B.C. ; Chang, T. ; Tsai, C. ; Huang, J.C.-M.

fYear

1997

fDate

3-5 June 1997

Firstpage

177

Lastpage

181

Keywords

Cleaning; Design for quality; Electric breakdown; Electron mobility; Furnaces; MOSFET circuits; Oxidation; Radio frequency; Scattering; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, Systems, and Applications, 1997. Proceedings of Technical Papers. 1997 International Symposium on

Conference_Location

Taipei, Taiwan

ISSN

1524-766X

Print_ISBN

0-7803-4131-7

Type

DOI

10.1109/VTSA.1997.614753

Filename

614753

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