The Effects Of Passivation And Post Passivation Anneal On The Integrity Of Thin Gate Oxides

Author

Gelatos, Carol ; Tseng, Hsing-Huang ; Filipiak, Stanley ; Sieloj, D. ; Grant, Jack ; Tobin, Philip ; Cotton, Randy

fYear

1997

fDate

3-5 June 1997

Firstpage

188

Lastpage

192

Keywords

Annealing; Assembly; Compressive stress; Hydrogen; Interface states; Optical films; Passivation; Surfaces; Tensile stress; Threshold voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, Systems, and Applications, 1997. Proceedings of Technical Papers. 1997 International Symposium on

Conference_Location

Taipei, Taiwan

ISSN

1524-766X

Print_ISBN

0-7803-4131-7

Type

DOI

10.1109/VTSA.1997.614755

Filename

614755

Link To Document