DocumentCode :
3268950
Title :
Bipolar transistors on thin SOI: concept, status and prospect
Author :
Cai, Jin ; Ning, Tak H.
Author_Institution :
IBM Semicond. Res. & Dev. Center, IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
Volume :
3
fYear :
2004
fDate :
18-21 Oct. 2004
Firstpage :
2102
Abstract :
Traditional high speed bipolar transistors are not compatible with the thin silicon-on-insulator substrates that are used for low power-delay product CMOS manufacturing. This paper discusses an SOI-CMOS compatible vertical bipolar transistor, from its inception to experimental verification on 120 nm SOI. Unique electrical characteristics, such as breakdown behavior and substrate bias dependency, are examined in detail and correlated to simple theory. Future directions and prospects of complementary SOI-BiCMOS are outlined.
Keywords :
BiCMOS integrated circuits; heterojunction bipolar transistors; semiconductor device breakdown; silicon-on-insulator; 120 nm; HBT; SOI; SiGe-Si-SiO2; breakdown voltage; collector voltage pinning; complementary SOI-BiCMOS; high speed bipolar transistors; low power-delay product CMOS; substrate bias dependency; thin silicon-on-insulator substrates; vertical bipolar transistor; BiCMOS integrated circuits; Bipolar transistors; CMOS technology; Capacitance; Electric variables; Insulation; Radio frequency; Silicon on insulator technology; Substrates; Switches;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN :
0-7803-8511-X
Type :
conf
DOI :
10.1109/ICSICT.2004.1435259
Filename :
1435259
Link To Document :
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