DocumentCode
3268950
Title
Bipolar transistors on thin SOI: concept, status and prospect
Author
Cai, Jin ; Ning, Tak H.
Author_Institution
IBM Semicond. Res. & Dev. Center, IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
Volume
3
fYear
2004
fDate
18-21 Oct. 2004
Firstpage
2102
Abstract
Traditional high speed bipolar transistors are not compatible with the thin silicon-on-insulator substrates that are used for low power-delay product CMOS manufacturing. This paper discusses an SOI-CMOS compatible vertical bipolar transistor, from its inception to experimental verification on 120 nm SOI. Unique electrical characteristics, such as breakdown behavior and substrate bias dependency, are examined in detail and correlated to simple theory. Future directions and prospects of complementary SOI-BiCMOS are outlined.
Keywords
BiCMOS integrated circuits; heterojunction bipolar transistors; semiconductor device breakdown; silicon-on-insulator; 120 nm; HBT; SOI; SiGe-Si-SiO2; breakdown voltage; collector voltage pinning; complementary SOI-BiCMOS; high speed bipolar transistors; low power-delay product CMOS; substrate bias dependency; thin silicon-on-insulator substrates; vertical bipolar transistor; BiCMOS integrated circuits; Bipolar transistors; CMOS technology; Capacitance; Electric variables; Insulation; Radio frequency; Silicon on insulator technology; Substrates; Switches;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN
0-7803-8511-X
Type
conf
DOI
10.1109/ICSICT.2004.1435259
Filename
1435259
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