• DocumentCode
    3268950
  • Title

    Bipolar transistors on thin SOI: concept, status and prospect

  • Author

    Cai, Jin ; Ning, Tak H.

  • Author_Institution
    IBM Semicond. Res. & Dev. Center, IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
  • Volume
    3
  • fYear
    2004
  • fDate
    18-21 Oct. 2004
  • Firstpage
    2102
  • Abstract
    Traditional high speed bipolar transistors are not compatible with the thin silicon-on-insulator substrates that are used for low power-delay product CMOS manufacturing. This paper discusses an SOI-CMOS compatible vertical bipolar transistor, from its inception to experimental verification on 120 nm SOI. Unique electrical characteristics, such as breakdown behavior and substrate bias dependency, are examined in detail and correlated to simple theory. Future directions and prospects of complementary SOI-BiCMOS are outlined.
  • Keywords
    BiCMOS integrated circuits; heterojunction bipolar transistors; semiconductor device breakdown; silicon-on-insulator; 120 nm; HBT; SOI; SiGe-Si-SiO2; breakdown voltage; collector voltage pinning; complementary SOI-BiCMOS; high speed bipolar transistors; low power-delay product CMOS; substrate bias dependency; thin silicon-on-insulator substrates; vertical bipolar transistor; BiCMOS integrated circuits; Bipolar transistors; CMOS technology; Capacitance; Electric variables; Insulation; Radio frequency; Silicon on insulator technology; Substrates; Switches;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
  • Print_ISBN
    0-7803-8511-X
  • Type

    conf

  • DOI
    10.1109/ICSICT.2004.1435259
  • Filename
    1435259