DocumentCode :
3269143
Title :
An RF low-noise broadband amplifier processed in 0.35um SiGe technology
Author :
Liu, Luncai ; Zhang, Zhengfan
Author_Institution :
Nat. Labs of Analog IC, Chongqing, China
Volume :
3
fYear :
2004
fDate :
18-21 Oct. 2004
Firstpage :
2144
Abstract :
The RF low-noise broadband amplifier in 0.35 μm SiGe technology, which has been successfully processed, was described in this paper. The amplifier has advantages such as wide bandwidth (≥3.2 GHz), low noise figure (NF≤2.0 dB), high power gain (S21≥27 dB), its output power at 1dB gain compression is greater than 9 dBm, and OIP3 is greater than or equal to 23 dBm. The design concept and the technology features of the broadband amplifier were described. The computer simulated results and the measured parameters of practical products were given, indicating that the process technology conforms well to the design technology.
Keywords :
Ge-Si alloys; MMIC amplifiers; bipolar MMIC; feedback amplifiers; semiconductor materials; wideband amplifiers; 0.35 micron; 2.0 dB; 27 dB; 3.2 GHz; HBT circuit; MMIC broadband amplifiers; RF low-noise broadband amplifier; SiGe; feedback amplifier; wide bandwidth amplifier; Bandwidth; Broadband amplifiers; Gain; Germanium silicon alloys; High power amplifiers; Low-noise amplifiers; Noise figure; Radio frequency; Radiofrequency amplifiers; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN :
0-7803-8511-X
Type :
conf
DOI :
10.1109/ICSICT.2004.1435267
Filename :
1435267
Link To Document :
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