Reticle haze measurement by spectroscopic ellipsometry

Author

Kim, Young-Hoon ; Kim, Sung-Hyuck ; Kim, Sung-Jin ; Park, Jin-Back ; Kyoung, Jai-Sun ; An, Il-Sin ; Oh, Hye-Keun

Author_Institution

Dept. of Appl. Phys., Hanyang Univ., Kyunggi, South Korea

fYear

2005

fDate

25-28 Oct. 2005

Firstpage

38

Lastpage

39

Abstract

This paper introduces the haze measurement method by using the spectroscopic ellipsometry. The quantity of the haze including the roughness of the reticle can be accurately measured by the spectroscopic ellipsometry. The haze inspecting method by this ellipsometric measurement does not give any damage to the sample, and it is not necessary to cover conductive material unlike to SEM, and it can get very small haze thickness difference by 0.2 ∼ 0.3 nm. One of the other merits of HIME is that the actual inspection time is only a few second. We can also obtain the mask roughness map as a function of dose. More details and applications of haze measuring process are presented and discussed.

Keywords

ellipsometry; masks; reticles; surface topography measurement; 0.2 to 0.3 nm; haze measurement method; mask roughness map; reticle haze measurement; reticle roughness; spectroscopic ellipsometry; Ellipsometry; Inspection; Pollution measurement; Rough surfaces; Semiconductor materials; Spectroscopy; Surface contamination; Surface roughness; Surface topography; Thickness measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2005 International

Print_ISBN

4-9902472-2-1

Type

conf

DOI

10.1109/IMNC.2005.203726

Filename

1595202