• DocumentCode
    3270306
  • Title

    Dependence of nitrogen incorporation of GaNAs alloys to growth conditions

  • Author

    Sentosa, Deny ; Xiaohong, Tang ; Jin, Chua Soo

  • Author_Institution
    Nanyang Technol. Univ., Singapore
  • Volume
    3
  • fYear
    2004
  • fDate
    18-21 Oct. 2004
  • Firstpage
    2345
  • Abstract
    The influence of growth temperature, reactor pressure, and N/V ratio on the nitrogen composition of MOCVD-grown GaNAs epilayers was studied. With the same growth temperature and N/V ratio, a reactor pressure of 20 mbar increases the nitrogen composition of GaNAs samples by almost 30% compared to samples grown with a reactor pressure of 60 and 100 mbar. The highest nitrogen content achieved of the GaNAs alloy is 0.0235 with an N/V ratio of 0.805 and reactor pressure of 20 mbar. By studying the nitrogen composition, a reactor pressure of 20 mbar enhances the nitrogen content of GaNAs alloys.
  • Keywords
    III-V semiconductors; MOCVD; gallium compounds; wide band gap semiconductors; 100 mbar; 20 mbar; 60 mbar; GaNAs; MOCVD grown epilayers; N/V ratio; growth temperature; metal organic molecular beam epitaxy; nitrogen composition; nitrogen incorporation growth condition dependence; reactor pressure; Gallium alloys; Gallium arsenide; III-V semiconductor materials; Inductors; MOCVD; Molecular beam epitaxial growth; Nitrogen; Photonic band gap; Temperature distribution; Tiles;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
  • Print_ISBN
    0-7803-8511-X
  • Type

    conf

  • DOI
    10.1109/ICSICT.2004.1435317
  • Filename
    1435317