DocumentCode
3270306
Title
Dependence of nitrogen incorporation of GaNAs alloys to growth conditions
Author
Sentosa, Deny ; Xiaohong, Tang ; Jin, Chua Soo
Author_Institution
Nanyang Technol. Univ., Singapore
Volume
3
fYear
2004
fDate
18-21 Oct. 2004
Firstpage
2345
Abstract
The influence of growth temperature, reactor pressure, and N/V ratio on the nitrogen composition of MOCVD-grown GaNAs epilayers was studied. With the same growth temperature and N/V ratio, a reactor pressure of 20 mbar increases the nitrogen composition of GaNAs samples by almost 30% compared to samples grown with a reactor pressure of 60 and 100 mbar. The highest nitrogen content achieved of the GaNAs alloy is 0.0235 with an N/V ratio of 0.805 and reactor pressure of 20 mbar. By studying the nitrogen composition, a reactor pressure of 20 mbar enhances the nitrogen content of GaNAs alloys.
Keywords
III-V semiconductors; MOCVD; gallium compounds; wide band gap semiconductors; 100 mbar; 20 mbar; 60 mbar; GaNAs; MOCVD grown epilayers; N/V ratio; growth temperature; metal organic molecular beam epitaxy; nitrogen composition; nitrogen incorporation growth condition dependence; reactor pressure; Gallium alloys; Gallium arsenide; III-V semiconductor materials; Inductors; MOCVD; Molecular beam epitaxial growth; Nitrogen; Photonic band gap; Temperature distribution; Tiles;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN
0-7803-8511-X
Type
conf
DOI
10.1109/ICSICT.2004.1435317
Filename
1435317
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