Development of nm resolution focus detector in vacuum for EUVM

Author

Tanaka, Yuzuru ; Hamamoto, Kazuhiro ; Watanabe, Takeo ; Kinoshita, Hiroo

Author_Institution

Lab. of Adv. Sci. & Technol. for Ind., Hyogo Univ., Japan

fYear

2005

fDate

25-28 Oct. 2005

Firstpage

102

Lastpage

103

Abstract

Since the numerical aperture of the optical system of the EUV microscope for mask inspection is as large as 0.3, the depth of focus becomes server within 100 nm. For this reason, the focus detection system which can operate in a vacuum environment and requires several 10 nm resolution is developed. Since this detector has to detect the sample position without contacting the surface of the sample, it employed the grazing incidence reflection system using laser light.

Keywords

focusing; inspection; masks; measurement by laser beam; nanotechnology; optical microscopes; optical sensors; ultraviolet lithography; EUV microscope; focus detection system; focus detector; grazing incidence reflection system; laser light; mask inspection; optical system; Detectors; Fiber lasers; Laser transitions; Optical microscopy; Optical surface waves; Photodiodes; Pollution measurement; Stability; Ultraviolet sources; Vacuum systems; Focusing Detector; Vacuum;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2005 International

Print_ISBN

4-9902472-2-1

Type

conf

DOI

10.1109/IMNC.2005.203758

Filename

1595234

Link To Document

https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3270490