DocumentCode :
3270948
Title :
Fabrication of nanosize aperture under electron beam exposure for optical trapping device
Author :
Choi, Seong Soo ; Kim, D.W. ; Kim, Y.C. ; Song, M.S. ; Shrestha, S. ; Joo, M.S.
fYear :
2005
fDate :
25-28 Oct. 2005
Firstpage :
150
Lastpage :
151
Abstract :
Recently there have been tremendous interests about single molecule trapping and characterization using nearfield optical technique. In order to manipulate and trap single molecule such as DNA, the trapping volume has to be significantly smaller than the normal optical trapping with laser beam. The evanescent field can provide the tiny trapping volume and can successfully trap single molecules. The nanosize metal aperture array has been designed and fabricated using various semiconductor fabrication techniques.
Keywords :
electron beams; nanoelectronics; radiation pressure; electron beam exposure; evanescent field; laser beam; nanosize metal aperture array; nearfield optical technique; optical trapping device; semiconductor fabrication techniques; single molecule trapping; trapping volume; Apertures; Charge carrier processes; Electron beams; Electron optics; Electron traps; Nanoscale devices; Optical beams; Optical device fabrication; Optical devices; Optical surface waves;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
Type :
conf
DOI :
10.1109/IMNC.2005.203782
Filename :
1595258
Link To Document :
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