• DocumentCode
    3270948
  • Title

    Fabrication of nanosize aperture under electron beam exposure for optical trapping device

  • Author

    Choi, Seong Soo ; Kim, D.W. ; Kim, Y.C. ; Song, M.S. ; Shrestha, S. ; Joo, M.S.

  • fYear
    2005
  • fDate
    25-28 Oct. 2005
  • Firstpage
    150
  • Lastpage
    151
  • Abstract
    Recently there have been tremendous interests about single molecule trapping and characterization using nearfield optical technique. In order to manipulate and trap single molecule such as DNA, the trapping volume has to be significantly smaller than the normal optical trapping with laser beam. The evanescent field can provide the tiny trapping volume and can successfully trap single molecules. The nanosize metal aperture array has been designed and fabricated using various semiconductor fabrication techniques.
  • Keywords
    electron beams; nanoelectronics; radiation pressure; electron beam exposure; evanescent field; laser beam; nanosize metal aperture array; nearfield optical technique; optical trapping device; semiconductor fabrication techniques; single molecule trapping; trapping volume; Apertures; Charge carrier processes; Electron beams; Electron optics; Electron traps; Nanoscale devices; Optical beams; Optical device fabrication; Optical devices; Optical surface waves;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2005 International
  • Print_ISBN
    4-9902472-2-1
  • Type

    conf

  • DOI
    10.1109/IMNC.2005.203782
  • Filename
    1595258