DocumentCode
3270948
Title
Fabrication of nanosize aperture under electron beam exposure for optical trapping device
Author
Choi, Seong Soo ; Kim, D.W. ; Kim, Y.C. ; Song, M.S. ; Shrestha, S. ; Joo, M.S.
fYear
2005
fDate
25-28 Oct. 2005
Firstpage
150
Lastpage
151
Abstract
Recently there have been tremendous interests about single molecule trapping and characterization using nearfield optical technique. In order to manipulate and trap single molecule such as DNA, the trapping volume has to be significantly smaller than the normal optical trapping with laser beam. The evanescent field can provide the tiny trapping volume and can successfully trap single molecules. The nanosize metal aperture array has been designed and fabricated using various semiconductor fabrication techniques.
Keywords
electron beams; nanoelectronics; radiation pressure; electron beam exposure; evanescent field; laser beam; nanosize metal aperture array; nearfield optical technique; optical trapping device; semiconductor fabrication techniques; single molecule trapping; trapping volume; Apertures; Charge carrier processes; Electron beams; Electron optics; Electron traps; Nanoscale devices; Optical beams; Optical device fabrication; Optical devices; Optical surface waves;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN
4-9902472-2-1
Type
conf
DOI
10.1109/IMNC.2005.203782
Filename
1595258
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