• DocumentCode
    3270977
  • Title

    On proximity effect in electron beam induced deposition

  • Author

    Mitsuishi, K. ; Shimojo, M. ; Takeguchi, M. ; Tanaka, M. ; Furuya, Keiichi

  • Author_Institution
    Nat. Inst. for Mater. Sci., Tsukuba, Japan
  • fYear
    2005
  • fDate
    25-28 Oct. 2005
  • Firstpage
    154
  • Lastpage
    155
  • Abstract
    Beam induced deposition is versatile technique to fabricate nano-structure. In this paper, the proximity effect in electron beam induced deposition was studied, and the beam scan sequence which minimizes the effect was suggested.
  • Keywords
    electron beam deposition; electron beam lithography; proximity effect (lithography); beam scan sequence; electron beam induced deposition; proximity effect; Electron beams; Electron emission; Ion beams; Laboratories; Materials science and technology; Proximity effect; Scanning electron microscopy; Shape; Switches; Tungsten;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2005 International
  • Print_ISBN
    4-9902472-2-1
  • Type

    conf

  • DOI
    10.1109/IMNC.2005.203784
  • Filename
    1595260
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3270977