• DocumentCode
    3271146
  • Title

    Manipulating Manufacturing Variations for Better Silicon-Based Physically Unclonable Functions

  • Author

    Forte, Domenic ; Srivastava, Ankur

  • Author_Institution
    Univ. of Maryland, College Park, MD, USA
  • fYear
    2012
  • fDate
    19-21 Aug. 2012
  • Firstpage
    171
  • Lastpage
    176
  • Abstract
    Physically Unclonable Functions (PUFs) provide interesting solutions to tnany security related issues. For instance, silicon-based PUFs are novel circuits that exploit manufacturing variations to extract unique signatures from chips. Such signatures are convenient for chip authentication and cryptographic key generation. Since variations are typically detrimental to ICs, a great deal of research is geared towards suppressing them. However, in the case of PUFs, it has been shown that wily systematic manufacturing variations are harmful and random manufacturing variations are actually the source of PUF quality. In this paper, we investigate two techniques that manipulate manufacturing variations to improve PUFs: (i) a cell layout technique that reduces systematic variation; (ii) a design technique that increases random variation. Results show that the layout technique improves PUF uniqueness by as much as 14% and the design technique improves PUF reliability by as much as 25%.
  • Keywords
    digital signatures; integrated circuit design; integrated circuit manufacture; microprocessor chips; private key cryptography; product design; public key cryptography; PUF quality; PUF reliability; PUF uniqueness; cell layout technique; chip authentication; chip signature; cryptographic key generation; design technique; integrated circuit; random manufacturing variation; silicon-based PUF; silicon-based physically unclonable function; systematic manufacturing variation; IEEE Computer Society; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI (ISVLSI), 2012 IEEE Computer Society Annual Symposium on
  • Conference_Location
    Amherst, MA
  • ISSN
    2159-3469
  • Print_ISBN
    978-1-4673-2234-8
  • Type

    conf

  • DOI
    10.1109/ISVLSI.2012.28
  • Filename
    6296468