DocumentCode :
3271656
Title :
Potential distribution in resistivity measurement for nanorods formed by electron beam induced deposition
Author :
Takeguchi, M. ; Shimojo, M. ; Tanald, M. ; Mitsuishi, M. ; Che, R. ; Zhang, W. ; Furuya, K.
Author_Institution :
High Voltage Electron Microscopy Station, Nat. Inst. for Mater. Sci., Tsukuba, Japan
fYear :
2005
fDate :
25-28 Oct. 2005
Firstpage :
232
Lastpage :
233
Abstract :
In the present work, EBID nanorods formed on a metal substrate and on tungsten tip were made contact in a transmission electron microscope (TEM) and its current vs. potential characteristics were measured in-situ. Electron holography was attempted to observe a local potential distribution (e.g., local resistance distribution) during the current-potential measurement.
Keywords :
electric current measurement; electrical resistivity; electron beam deposition; electron holography; nanoelectronics; nanostructured materials; transmission electron microscopy; EBID; current-potential measurement; electron beam induced deposition; electron holography; metal substrate; nanorod; potential distribution; resistivity measurement; transmission electron microscope; tungsten tip; Conductivity measurement; Electrical resistance measurement; Electron beams; Holography; Materials science and technology; Nanoscale devices; Nanostructures; Nanowires; Transmission electron microscopy; Tungsten;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
Type :
conf
DOI :
10.1109/IMNC.2005.203823
Filename :
1595299
Link To Document :
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