DocumentCode
3271807
Title
Fabrication of multi-layered structure by advanced reversal imprints lithography
Author
Nishihata, Masayoshi ; Okuda, Keisuke ; Aoyama, Takashi ; Yoshikawa, Takashi ; Hirai, Yoshihiko
Author_Institution
Graduate Sch. of Eng., Osaka Prefecture Univ., Japan
fYear
2005
fDate
25-28 Oct. 2005
Firstpage
252
Lastpage
253
Abstract
Advanced reversal imprint process to eliminate the breaking defects at the pattern edge is newly proposed and demonstrate contact window pattern transfer on the lower layer. We believe this technology is promising for advanced μ-TAS devices or bio-chips containing multi-layered micro fluid channels for 3-dimensional multi-layered structures.
Keywords
nanolithography; 3D multilayered structures; advanced μ-TAS devices; advanced reversal imprints lithography; bio-chips; multilayered micro fluid channels; multilayered structure fabrication; pattern edge; pattern transfer; Coatings; Glass; Lithography; Optical device fabrication; Optical microscopy; Polymer films; Scanning electron microscopy; Shape; Surface tension; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN
4-9902472-2-1
Type
conf
DOI
10.1109/IMNC.2005.203833
Filename
1595309
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