DocumentCode :
3272023
Title :
Electrodeposition of organic dielectric and its application to MEMS devices
Author :
Sakata, Tomomi ; Ishii, Hiromu ; Okabe, Yuichi ; Sato, Norio ; Kudou, Kazuhisa ; Machida, Katsuyuki
Author_Institution :
NTT Microsyst. Integration Labs., Atsugi, Japan
fYear :
2005
fDate :
25-28 Oct. 2005
Firstpage :
276
Lastpage :
277
Abstract :
We developed a method for the uniform electrodeposition of organic dielectric on gold electrodes after the release process in MEMS device fabrication. The method involves dipping in HClaq and HClaq as pre-treatment and an optimized annealing temperature as post-treatment. The method proved its effectiveness on the gold comb-shaped electrodes in vibrational MEMS devices.
Keywords :
annealing; dielectric thin films; electrodeposition; electrodes; gold; micromechanical devices; organic compounds; MEMS device; annealing temperature; comb-shaped electrode; electrodeposition; gold electrode; organic dielectric; Actuators; Annealing; Coatings; Dielectric devices; Electrodes; Gold; Microelectromechanical devices; Plasma applications; Plasma devices; Shape;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
Type :
conf
DOI :
10.1109/IMNC.2005.203845
Filename :
1595321
Link To Document :
بازگشت