DocumentCode

3277681

Title

Modeling the Growth and Annealing of Dislocation Loops

Author

Borucki, L.

Author_Institution

Motorola Advanced Custom Technology Center

fYear

1992

fDate

31 May-1 Jun 1992

Firstpage

27

Lastpage

32

Keywords

Absorption; Boron; Equations; Implants; Oxidation; Rapid thermal annealing; Rapid thermal processing; Silicon; Stress; Temperature distribution;

fLanguage

English

Publisher

ieee

Conference_Titel

Numerical Modeling of Processes and Devices for Integrated Circuits, 1992. NUPAD IV. Workshop on

Print_ISBN

0-7803-0516-7

Type

conf

DOI

10.1109/NUPAD.1992.673842

Filename

673842