Title :
Fractal Network Diffusicm of Fluorine and Boron in Polysilicon Gates
Author :
Orlowski, Marius ; Tseng, Hsing-Huang ; Hance, Robert ; Tobin, Philip J.
Author_Institution :
Motorola, Inc.
fDate :
31 May-1 Jun 1992
Keywords :
Annealing; Boron; Equations; Fractals; Grain boundaries; Inorganic materials; Intelligent networks; MOSFET circuits; Silicon; Temperature distribution;
Conference_Titel :
Numerical Modeling of Processes and Devices for Integrated Circuits, 1992. NUPAD IV. Workshop on
Print_ISBN :
0-7803-0516-7
DOI :
10.1109/NUPAD.1992.673843
