DocumentCode

3277907

Title

Fractal Network Diffusicm of Fluorine and Boron in Polysilicon Gates

Author

Orlowski, Marius ; Tseng, Hsing-Huang ; Hance, Robert ; Tobin, Philip J.

Author_Institution

Motorola, Inc.

fYear

1992

fDate

31 May-1 Jun 1992

Firstpage

35

Lastpage

40

Keywords

Annealing; Boron; Equations; Fractals; Grain boundaries; Inorganic materials; Intelligent networks; MOSFET circuits; Silicon; Temperature distribution;

fLanguage

English

Publisher

ieee

Conference_Titel

Numerical Modeling of Processes and Devices for Integrated Circuits, 1992. NUPAD IV. Workshop on

Print_ISBN

0-7803-0516-7

Type

conf

DOI

10.1109/NUPAD.1992.673843

Filename

673843