Title :
The Effect of Nondilute Dopant-Defect Pair Concentrations on Arsenic Diffusion
Author :
Novell, Paul ; Law, Mark E.
Author_Institution :
University of Florida
fDate :
31 May-1 Jun 1992
Keywords :
Nonlinear equations; Oxidation; Semiconductor process modeling; Temperature dependence; Testing;
Conference_Titel :
Numerical Modeling of Processes and Devices for Integrated Circuits, 1992. NUPAD IV. Workshop on
Print_ISBN :
0-7803-0516-7
DOI :
10.1109/NUPAD.1992.673844
