• DocumentCode
    3278576
  • Title

    Reverse Short-Channel Effects due to the Lateral Diffusion of the Point-Defects Induced by the Source/Drain Ion Implantation

  • Author

    Kunikiyo, Tatsuya ; Mitsui, Katsuyoshi ; Fujinaga, Masato ; Uchida, Tetsuya ; Kotani, Norihiko ; Akasaka, Yoichi

  • Author_Institution
    Mitsubishi Electric Corporation
  • fYear
    1992
  • fDate
    31 May-1 Jun 1992
  • Firstpage
    51
  • Lastpage
    56
  • Keywords
    Atmosphere; Boron; Fabrication; Implants; Ion implantation; Laboratories; Large scale integration; MOSFET circuits; Silicon; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Numerical Modeling of Processes and Devices for Integrated Circuits, 1992. NUPAD IV. Workshop on
  • Print_ISBN
    0-7803-0516-7
  • Type

    conf

  • DOI
    10.1109/NUPAD.1992.673846
  • Filename
    673846
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3278576